Design and microfabrication of bioMEMS, pressure sensor arrays, gas sensors, bi - NJ Institute of Technology
Asset(s): ISO 4 Class 10 Clean room, Class 100 Clean roomAsset Desscription: Equipped for microfabrication of 3-, 4-, 5-, and 6-inch silicon, glass, ceramic, and polymer wafers, Isotropic and anisotropic chemical etching, Reactive Ion Etching (RIE), DRIE, DC reactive magnetron sputtering of metal thin films, E-beam evaporation, Wafer bonding, 0.7 micron photolithography, High-temperature furnaces of silicon oxidation, Plasma Enhanced Chemical Vapor Deposition (PECVD), SiN, SiO2, a-Si, Low Pressure Chemical Vapor Deposition (LPCVD)
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